ESC

Techniques....................................................................................................3

Subject

ESC

Type

course

Source

www.mc3.edu

Nanofabrication.............................................................................................3 4 ESC 212 - Basic Nanotechnology Processes.............................................. 3 4 ESC 213 - Materials in Nanotechnology...................................................... 3 4 ESC 214 - Patterning for Nanofabrication....................................................3

Subject

ESC

Type

course

Source

www.mc3.edu

..... This course is an overview of the broad spectrum of processing approaches involved in "top down", "bottom up", and hybrid nanofabrication. The majority of the course details a step-by-step description of the equipment, facilities processes and process flow used in today's device and structure fabrication. Students learn to appreciate processing and manufacturing concerns including safety, process control, contamination, yield, and processing interaction. The students design process flows for micro- and nano-scale systems. Students learn the similarities and differences in "top down" and "bottom up" equipment and process flows by undertaking hands-on processing. This hands-on overview exposure covers basic nanofabrication processes including deposition, etching, and pattern transfer. This course is designed to be one of six capstone courses (Esc 211, 212, 213. 214, 215, 216) for the Penn State Semiconductor Manufacturing Technology (SMT) program. The course is lab intensive, leveraging the Nanofabrication Facility on the University Park campus. All lectures will be given in a technology classroom, Suite 114 Lubert bldg., Research Park. This classroom is dedicated to the Center for Semiconductor Manufacturing Technology and thus has a wide variety of very specialized, "hands-on" materials and facilities continually available to students. The course grade evaluation will use a mixture of tests, presentations, reports, and project assignments. Teaming and team problem solving will be stressed. n Prerequisites:

Subject

ESC

Credits (min)

2

Credits (max)

2

Type

course

Source

www.mc3.edu

This course is an in-depth, hands-on exposure to the producing and tailoring of the materials used in nanofabrication. The course will cover chemical materials production techniques such as colloidal chemistry; atmosphere, low-pressure and plasma enhanced chemical vapor deposition; nebulization; and atomic layer deposition. It will also cover physical techniques such as sputtering; thermal and electron beam evaporation; and spin-on approaches. This course is designed to give students experience in producing a wide variety of materials tailored for their mechanical, electrical, optical, magnetic, and biological properties. This course is designed to be one of six capstone courses (Esc 211, 212, 213, 214, 215, 216) for the Penn State Semiconductor Manufacturing Technology (SMT) program. The course is lab intensive, leveraging the Nanofabrication Facility on the University Park campus. All lectures will be given in a technology classroom, Suite 114 Luber bldg., Research Park. This classroom is dedicated to the Center for Semiconductor Manufacturing Technology and thus has a wide variety of very specialized, "hands-on" materials and facilities continually available to students. The course grade evaluation will use mixture of tests, presentations, reports and project assignments. Teaming and team problem solving will be stressed. Prerequisites:

Subject

ESC

Credits (min)

2

Credits (max)

2

Type

course

Source

www.mc3.edu

This course is a hands-on treatment of all aspects of advanced pattern transfer and pattern transfer equipment including probe techniques; stamping and embossing; e-beam; and optical contact and stepper systems. The course is divided into five major sections. The first section is an overview of all pattern generation processes covering aspects from substrate preparation to tool operation. The second section concentrates on photolithography and examines such topics as mask template, and mold generation. Chemical makeup of resists will be discussed including polymers, solvents, sensitizers, and additives. The role or dyes and antireflective coatings will be discussed. In addition, critical dimension (CD) control and profile control of resists will be investigated. The third section will discuss the particle beam lithographic techniques such as e- beam lithography. The fourth section covers probe pattern generation and the fifth section explores imprinting lithography, step-and-flash, stamp lithography, and self-assembled lithography. This course is designed to be one of six capstone courses (Esc 2ll, 212,213,214, 215, 216) for the Penn State Semiconductor Manufacturing Technology (SMT) program. The course is lab intensive, leveraging the Nanofabrication Facility on the University Park campus. All lectures will be given in a technology classroom, Suite 114 Lubert bldg., Manufacturing Technology and thus has a wide variety of very specialized, "hands-on" materials and facilities continually available to students. The course grade evaluation will use a mixture of tests, presentations, reports, and project assignments. Teaming and tem problem solving will be stressed. Prerequisites:

Subject

ESC

Credits (min)

2

Credits (max)

2

Type

course

Source

www.mc3.edu

This course covers the applications of nano-scale devices and systems and the material chemical, physical, biological, or multiple-property requirements necessitated in these applications. Material modifications to meet these requirements will be addressed including structure control, composition control, surface property control, strain control, functionalization, and doping. This course is designed to be one of six capstone courses (Esc 211, 212, 213, 214, 215, 216) for the Penn State Semiconductor Manufacturing Technology (SMT) program. The course is lab intensive, leveraging the Nanofabrication Facility on the University Park campus. All lectures will be given in a technology classroom, Suite 114 Lubert Bldg., Research Park. This classroom is dedicated to the Center for Semiconductor Manufacturing Technology and thus has a wide variety of very specialized, "hands-on" materials and facilities continually available to students. The course grade evaluation will use a mixture of tests, presentations, reports, and project assignments. Teaming and team problem solving will be stressed. Prerequisites:

Subject

ESC

Credits (min)

2

Credits (max)

2

Type

course

Source

www.mc3.edu

Structures......................................................................................................3

Subject

ESC

Type

course

Source

www.mc3.edu